First Moment by Gay Lasher
46.25" x 48.5"
Paper-backed cotton sheeting with Fabrisign II coating, Epson Ultrachrome Inks, warm and natural batting; polyester, cotton, rayon and monofilament thread.
Beginning July 26 and running through November 9, 2014 is the International TECHstyle Art Biennial 3 (ITAB) exhibition at the San Jose Museum of Quilts & Textiles.
The exhibition is returning for its third incarnation. It is a juried exhibition of work by artists merging fiber media with new information and communication technologies in their artistic processes, as a medium of artistic expression, and/or in the content of their work. This year jurors Louise Lemieux Bérubé, Patricia Malarcher, and Michael James brought their expert consideration and aesthetic to select work from a new pool of national and international entries.
As a part of their technical and artistic processes artists use techniques of digital jacquard weaving, digital printing, digital photography, manipulation of imagery using various computer programs, laser engraving, or computerized embroidery. As in previous years, some of the work is low tech while creating interesting themes and ideas about the technological world that we live in. ITAB showcases the tools of technology that allow artists to further their artistic visions as they explore the possibilities and inventions of textile art in the 21st century.
Thirty nine works are included by 36 artists from the United States, Canada, France, Hungary, Lithuania, New Zealand, and South Korea.
520 South First Street
San Jose, CA 95113
Tel: 408.971.0323, Fax: 408.971.7226